Multicusp ion source with external RF antenna for production of H− ions

A multicusp ion source with modular design was developed at LBNL for production of H− ions. The source consists of a front plate, two multicusp front chambers, a quartz flange with external 3-loop RF antenna and a rear multicusp chamber. The source has LaB6 sputtering target at the rear chamber to lower the work function of the surfaces by coating them with LaB6 and an external cesium oven on the front plate. The front plate also has an integrated collar and filter magnets to cool plasma near the extraction. The collar also enables the use of cesium and LaB6 surface effects. The rear chamber is equipped with three vacuum feed-throughs for operation with two gases and a pressure measurement. Current density of over 10 mA/cm2 of H− has been measured with e/I− ratio being ∼100 when the source was operated with only 1000 W of cw RF power. Negative ion production was enhanced using cesium, Xe gas mixing and LaB6 deposition to the source surfaces. When the front plate with filter magnets is removed, the source produces large amounts of H+. Current density of 110 mA/cm2 with 1800 W RF power at 2.3 Pa source pressure was measured with over 90 % atomic species. A long operation lifetime is excepted as the external RF antenna is not exposed to plasma.